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Patternable Mesoporous Thin Film Quantum Materials via Block Copolymer Self-Assembly: An Emergent Technology?

4. F. Yu, R. P. Thedford, K. R. Hedderick, G. Freychet, M. Zhernenkov, L. A. Estroff, K. C. Nowack, S. M. Gruner, U. B. Wiesner
Jul. 2021

ACS Applied Materials & Interfaces 13,34732 (2021).